For pt.I see ibid., vol.16, p.6491 (1983). The electrical conductivity sigma (T,x) of amorphous Si1-xCrx films is studied for T=0.1-300K and x=0.09-0.26. The existence of a finite minimum metallic conductivity sigma mm is shown by two independent methods, which yield 270+or-50 Omega -1 cm-1 and 250+or-30 Omega -1 cm-1 respectively. On both sides of the metal-semiconductor transition (with respect to the conductivity scale) only one parameter depending on x and preparation conditions is needed to describe sigma (T) for low T. In particular, on the semiconducting side a scaling law, sigma = sigma (T/T0(x, . . .)), is valid. On the metallic side a contribution beta T1/2 is observed, where beta is completely determined by sigma (0K). The function beta ( sigma (0K)) exhibits a square-root singularity at sigma mm. The critical Cr concentration xc is weakly influenced by the preparation conditions; it amounts to about 0.14. At high temperatures a second conduction mechanism becomes important. This mechanism is present on both sides of the transition. A quantitative description of the related conductivity contribution is given for both the metallic and semiconducting regions. Annealing of semiconducting samples at temperatures of about 300 degrees C or higher destroys the scaling behaviour, presumably due to the formation of metallic clusters. In particular, it gives rise to a decrease of the pre-exponential factor of sigma (T).