The crystalline structure of thin films of ZnS, prepared by reactive cathodic sputtering, has been studied in relation to the parameters of the synthesis: anode-cathode voltage, H2S ratio in the gaseous mixture, anode and cathode temperatures.
The principal structure types of ZnS are cubic zinc-blende, which is normally obtained at temperatures lower than 1000°C, and hexagonal wurtzite, obtained at higher temperatures. With reactive cathodic sputtering one can obtain either blende, or wurtzite, at low temperatures by modification of one parameter.
It is shown that sputtered ZnS films have the wurtzite structure when the values of the parameters are such that an excess of zinc is condensed for instance in the case of a high voltage, or at a low H2S ratio. They have the blende structure in the opposite case. The blende structure shows preferential orientation, with the [111] axis perpendicular to the substrate, when the H2S ratio is very high.