A field-emission retarding-potential device is described which has been specifically designed to fit typical UHV surface research systems. The design and construction of the lens system are fully described. Its performance is demonstrated, both as an energy analyser for the field-emitted electrons and in the determination of the absolute, area-averaged work function of UHV-evaporated films of aluminium, copper, gold and silver. The values obtained for these metals are 4.26+or-0.02, 4.64+or-0.02, 5.37+or-0.02 and 4.46+or-0.02 eV respectively. In view of (i) the clean conditions of film growth, (ii) the proven purity of the films (by Auger electron spectroscopy), and (iii) the demonstrated reproducibility of the technique, it is claimed that these measurements have yielded the most reliable work function values yet available for thin films of the four metals studied.