Simulations of an electromigration-induced edge instability in single-crystal metal lines

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1999 EDP Sciences
, , Citation M. Mahadevan et al 1999 EPL 45 680 DOI 10.1209/epl/i1999-00221-7

0295-5075/45/6/680

Abstract

We study the time evolution of a perturbation to the edge of an otherwise straight, current-carrying, single-crystal metal line. If the applied current exceeds a critical value, the perturbation grows to become a slit-shaped void that spans the wire, and that leads to electrical failure. The slits in our simulations are remarkably similar to those observed in experiments, and in some respects resemble viscous fingers in a Hele-Shaw cell.

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10.1209/epl/i1999-00221-7