Abstract
The (100), (110), and (111) surfaces of Fe3Si have been studied by quantitative Low-Energy Electron Diffraction and Auger Electron Spectroscopy. Reversible phase transitions between the D03 and the CsCl structure develop upon annealing, triggered by a substantial reversible surface segregation of Si. On all surfaces, Si termination is preferred either by realizing a topmost Si layer whenever the choice between Si and Fe exists, or by direct Si occupation of nominal Fe sites. Similarities to epitaxial iron silicide films structural behaviour are identified.
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