Origin of temperature dependence in tunneling magnetoresistance

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2003 EDP Sciences
, , Citation J. J. Åkerman et al 2003 EPL 63 104 DOI 10.1209/epl/i2003-00484-4

0295-5075/63/1/104

Abstract

We present detailed measurements of the differential resistance (dV/dI) of state-of-the-art FM/AlOx/FM magnetic tunnel junctions (MTJ) as a function of applied bias and temperature. Temperature effects are particularly significant in physical quantities involving narrow features such as those at low-voltage bias. We show that the temperature evolution of the tunneling characteristics and, in particular, the pronounced rounding of the dV/dI curves with increasing temperature can be well explained by thermal smearing of the tunneling electron energy distribution.

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10.1209/epl/i2003-00484-4