Dynamics of complete wetting liquid under evaporation

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Published 5 January 2011 • Europhysics Letters Association
, , Citation C.-T. Pham et al 2010 EPL 92 54005 DOI 10.1209/0295-5075/92/54005

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This article is corrected by 2011 EPL 93 69901

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1 Laboratoire d'Informatique pour la Mécanique et les Sciences de l'Ingénieur (LIMSI), UPR 3251 du CNRS, Université Paris Sud11 - BP 133, 91403 Orsay cedex, France, EU

2 Laboratoire Matière et Systèmes Complexes (MSC), UMR 7057 CNRS & Université Paris Diderot 10 rue Alice Domon et Léonie Duquet, 75013 Paris, France, EU

3 Laboratoire Physico-chimie des Polymères et Milieux Dispersés (PPMD), UMR 7615 du CNRS, ESPCI 10 rue Vauquelin, 75005 Paris, France, EU

Dates

  1. Received 19 April 2010
  2. Accepted 23 November 2010
  3. Published
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0295-5075/92/5/54005

Abstract

The dynamics of a contact line under evaporation and total-wetting conditions is studied taking into account van der Waals interactions and the divergent nature of evaporation near the border of the liquid . The existence of a precursor film at the edge of the liquid is shown analytically and numerically. Its length is controlled by the Hamacker constant and evaporative flux. Past the precursor film, Tanner's law is generalized accounting for evaporative effects.

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