Mo/Si multilayer (ML) mirrors play a decisive role in an extreme-ultraviolet
(EUV) lithography process. In this study, the surface and interfacial roughness, as
well as the lateral and vertical correlation lengths, of a series of Mo/Si MLs
deposited by RF-magnetron sputtering (RF-MS) have been characterized using
diffuse x-ray scattering and atomic force microscopy. We have investigated the
influence of the substrate quality and material (silicon, ule and zerodur) on the
propagation and the value of ML roughness. We show that, whatever the
substrate is, the film deposited by RF-MS presents a reduced roughness
compared with that of the substrate. Moreover, rocking-curve analyses show
that, for Si and ule substrates, the ML average roughness is very low
(<
1.5 Å), associated with high spatial frequency oscillations, while in the
case of zerodur substrates, the roughness is significantly increased
(> 2 Å),
and the high spatial frequency oscillations are reduced. Finally, the combination
of specular and non-specular small-angle x-ray results allows us to evaluate
another key parameter, namely, the uncorrelated roughness which is an intrinsic
characteristic related to the choice of both the deposition technique and the
materials. This intrinsic roughness is found to be very low (2 Å) and constitutes a
good argument in favour of the use of the RF-MS technique for EUV mirror
deposition.