This special issue of Journal of Physics: Condensed Matter contains a selection of invited
and contributed papers presented at Symposium J: Synchrotron Radiation for
Advanced Materials Analysis and Processing, part of the International Conference on
Materials for Advanced Technologies 2003 (ICMAT 2003) and the International Union of Materials
Research Societies International Conference in Asia 2003 (IUMRS-ICA 2003) which was held
on 7–12 December 2003 in Singapore. ICMAT 2003 attracted more than 1500
participants and was graced by the presence of Nobel laureates Klaus von Klitzing and
Sir Harry W Kroto who gave plenary and public lectures.
One of 16 symposia, Symposium J brought together 54 researchers with various
backgrounds from Asia, Australia, Europe and North America. In a relaxed and comfortable
atmosphere, participants were presented 1 keynote and 17 invited papers, and 15
contributed oral talks as well as 21 posters covering diverse cutting-edge work made
possible by exploiting synchrotron radiation.
The relaxed atmosphere encouraged lively discussions.
This special issue contains a variety of topics which are briefly described here with
reference to the keynote and invited papers. H-D Nuhn paints a broad picture of the
successful development of third-generation storage-ring-based synchrotron light sources
and the ongoing projects aimed at building x-ray free electron lasers. Then, using
photoemission, L I Johansson discusses the nature of the SiO2/SiC interface that is attracting
keen interest for its significance for semiconductor manufacturing. Presenting
photoelectron diffraction, E G Michel takes the same material and shows the solution of the
atomic structure in the case of the (3×2) surface reconstruction of cubic SiC. S Lizzit
describes the production of high-quality thin films of the inter-metallic superconductor
MgB2 by molecular beam epitaxy and their characterization by photoemission, absorption
spectroscopy, and low-energy electron diffraction. Using data obtained by simultaneous
wide- and small-angle scattering as well as x-ray absorption spectroscopy, N Greaves
gives a detailed explanation of how zeolites collapse when pressurized or heated. Moving on
to polymers, H J Kim investigates surface capillary waves on polymer films via x-ray
photon correlation spectroscopy. The growth of biological cells on polymer scaffolds
is studied by P Thurner using micro-computed tomography with synchrotron radiation. S
Cabrini gives an overview of the use of x-ray lithography to fabricate micro- and
nano-devices for various applications. Finally, N Umesaki reports examples of
applications of synchrotron radiation to characterize important industrial samples and
processes.
It is a special pleasure to acknowledge the strong and comprehensive help of co-chairs O
Wilhelmi and P Yang and of Ms K L Chong. Many thanks as well to the members of
the Scientific Committee who gave their advice, to the members of the Local Organizing
Committee, the Session Chairmen, and the Exhibitors and Sponsors. Last, but not least, the
effort of authors and referees as well as of the publisher to produce this special issue is
greatly appreciated.
Herbert O Moser
Singapore Synchrotron Light Source, National University of Singapore e-mail: moser@nus.edu.sg
Chair: Symposium J, ICMAT 2003
Scientific Committee
H Dosch (Chair), MPI for Metal Research, Germany
S Baik, Pohang Light Source, Korea
G L Carr, NSLS, USA
R J Cernik, Daresbury Laboratory, UK
G N Greaves, University of Wales, Aberystwyth, UK
S Kikuta, JASRI, Japan
M Kovalchuk, RAS, Russia
Z H Mai, Beijing Synchrotron Radiation Facility, China
G Margaritondo, EPFL, Switzerland
N Mårtensson, MAX Lab and University of Uppsala, Sweden
T Matsushita, Photon Factory, Japan
H O Moser, SSLS, Singapore
H Ohno, SPring-8, Japan
H A Padmore, ALS, USA
P Soukiassian, CEA and Université Paris-Sud, France
A Stevenson, CSIRO, Australia
W G Stirling, ESRF, France
M Taniguchi, HISOR, Japan
Local Organizing Committee
H O Moser (Chair), SSLS/NUS
K L Chong, SSLS/NUS
W S Sim, NUS/Chemistry
A T S Wee, NUS/Physics
O Wilhelmi, SSLS/NUS
P Yang, SSLS/NUS
Exhibitors
FEI
Hecus M Braun
M-O-T
Nanofilm Technologies International
Raith
Sponser
PRIMA Research and Technologies