This special issue is formed from a collection of selected papers that were
presented at the 8th International Symposium on Nanostructures: Physics
and Technology in 2000 (www.ioffe.rssi.ru/NANO2000/). The annual
symposia are chaired by two Nobel Prize winners, Professor Zh Alferov and
Professor L Esaki, and are traditionally organized by the Ioffe
Institute in Repino - a suburb of St Petersburg. The Symposium was
launched in 1993 by its Chairs as one of the first in an area that is
becoming one of the leading and more important directions within modern
solid state physics and technology.
Perhaps it would be appropriate to recall the history of the prefixnano in the title of the Symposium. In the late 1950s, Dr J
Kilby at Texas Instruments and Dr R Noyce at Fairchild Semiconductor
proposed the fabrication of integrated electronic circuits on
germanium and silicon crystals, and successfully realized this idea. This
created, after the invention of the transistor by J Bardeen,
W Brattain and W Shockley in 1947, the next great revolution in information
technology. The integrated circuits were formed with elements on the
micrometre scale; this is why this area of science and technology
became known as microelectronics. However, this development
led to a decrease of the characteristic scale to a submicron level. Actually,
the typical thickness of the oxide film on Si-based integrated
circuits is now about 10 nm and the gate width is a little more than 100
nm.
In the middle of the 1960s, a new direction in solid state
electronics and optoelectronics was pushed forward. This direction was
based on applications of semiconductor heterostructures. The foundations
of this area were laid by Zh Alferov and H Kroemer.
Heterostructure applications make real the exploitation of quantum mechanical
behaviour of electrons and holes in solids. The basic concepts in this
area were given by L Keldysh (1962), L Ioganson (1963), R Davis and
H Hosack (1963), L Esaki and R Tsu (1969), R Kazarinov and R Suris
(1971) and R Dingle and C Henry (1974). Naturally, to provide
quantum mechanical behaviour and avoid carrier scattering by
phonons and lattice defects, it was necessary to fabricate
structures on the nanometre scale. This had become possible
because of the pioneering work by A Cho on molecular beam epitaxy.
Following L Esaki, the fabrication of structures and devices with
quantized electrons and holes can be called `carrier wavefunction
engineering'.
The development of nanoscale semiconductor heterostructures
led to the low threshold injection lasers with quantum wells and the
high-speed transistors that revolutionized information
transmission and storage technologies.
Recently, the team headed by Zh Alferov demonstrated the
possibility of further radical improvement in semiconductor
laser performance characteristics with the use of nanostructures with
quantum dots. New remarkable achievements in the mid- and
far-infrared techniques are in progress. First of all, there is a quantum
cascade laser that was created by the team of F Capasso and quantum
well infrared photodetectors utilizing intrasubband electron (hole)
transitions. New structures and technologies based on
applications of nanoclusters such as carbon nanotubes are under
consideration.
So now the terms nanoelectronics and nanostructures are
as widely in use as the terms microelectronics and microstructures.
It is natural that the Symposium is traditionally organized by
the Ioffe Institute and held in St Petersburg. Here, N Goryunova
and A Regel, at the same time as H Walker, discovered the semiconducting
properties of the group III-V compounds that became the basic materials for
semiconductor nanostructures. Here, the
first `ideal' GaAlAs heterostructures and the heterostructure lasers were proposed and developed, and
here also, many of the basic concepts in semiconductor
electronics and optoelectronics were formulated. The Ioffe Institute is still pioneering
in many directions of this impetuously developing area.
The 9th International Symposium on Nanostructures: Physics
and Technology
will be held on 18-22 June, 2001, see www.ioffe.rssi.ru/NANO2001.