Transmission electron microscopy (TEM) is a key technique in the structural
characterization of carbon nanotubes. For device applications, carbon nanotubes are
typically grown by chemical vapour deposition (CVD) on silicon substrates. However, TEM
requires very thin samples, which are electron transparent. Therefore, for TEM
analysis, CVD grown nanotubes are typically deposited on commercial TEM grids by
post-processing. However, this procedure can damage the nanotubes, and it does not work
reliably if the nanotube density is too low. The ability to do TEM directly on as-grown
nanotubes on the silicon substrate would solve these problems. For this purpose, we have
fabricated micromachined silicon TEM grids with narrow open slits on them.
Since the nanotubes grown on these substrates are suspended freely over the open
slits, the micromachined substrates form a natural TEM grid for direct imaging
of CVD grown nanotubes. Furthermore, the background noise is significantly
reduced during micro-Raman spectroscopy, resulting in a better signal-to-noise
ratio. As a result, these micromachined Si substrates provide a low cost, mass
producible, efficient, and reliable platform for direct TEM, SEM, AFM, and Raman
characterization of as-grown nanotubes. These grids can be used for characterizing a
wide range of other nanomaterials, including peapods, nanowires, and nanofibres.