Ultrascaled InAlN/GaN High Electron Mobility Transistors with Cutoff Frequency of 400 GHz

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Published 31 May 2013 Copyright (c) 2013 The Japan Society of Applied Physics
, , Citation Yuanzheng Yue et al 2013 Jpn. J. Appl. Phys. 52 08JN14 DOI 10.7567/JJAP.52.08JN14

1347-4065/52/8S/08JN14

Abstract

We report on 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs) with a record current gain cutoff frequency (fT) of 400 GHz. Although the high drain-induced barrier lowering (DIBL) value is indicative of significant short-channel effects, more than seven orders of magnitude in the current on/off ratio was observed. The high fT is a result of minimized parasitic effects and at the expense of a low power gain cutoff frequency (fMAX). The gate length dependence and temperature dependence of fT were also measured.

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