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Strain, composition and disorder in ADF imaging of semiconductors

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Published under licence by IOP Publishing Ltd
, , Citation V Grillo et al 2011 J. Phys.: Conf. Ser. 326 012006 DOI 10.1088/1742-6596/326/1/012006

1742-6596/326/1/012006

Abstract

The effect of strain, composition and disorder in ADF images is systematically studied as a function of detection angle in order to understand the main contrast mechanisms. We demonstrate that the complex phenomenology in ADF images can be accounted for by accurate simulations and modelling. The advantage of an accurate modelling on the image interpretation will be demonstrated in the case of dislocations, chemical analysis of InGaP/GaAs and most noticeably the measurement of both In and N content in quaternary InGaAsN.

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10.1088/1742-6596/326/1/012006